关键词:
MOSFET
power MOSFET
Schottky diodes
semiconductor device breakdown
semiconductor devices
摘要:
An improved 4H-SiC SBD-wall-integrated trench metal-oxide-semiconductor (SWITCH-MOS) with n-bury and split-gate is proposed. Under the premise of ensuring breakdown voltage (BV), the n-bury layer can smooth the path to current conduction, which reduces the specific on-resistance (RON, SP) and improves static characteristics. Besides, the split-gate is able to transform the gate-drain capacitance (CGD) and improve the dynamic characteristics. Therefore, a superior forward performance that SWITCH-MOS always craves is achieved. According to the simulation results, compared to the conventional SWITCH-MOS with almost the same BV, the proposed one reduces the RON, SP by 57% and the CGD by 59% while gaining equally advanced reverse performance. Its reverse conduction voltage is only -1.78 V, but its figure of merit reaches 1.67 GW/cm2 and 65 m OmeganC, which is attractive for the application in power inverters.