关键词:
III-V semiconductor materials
Aluminum nitride
Etching
Logic gates
Surface treatment
Capacitance
Surface morphology
Logic
HEMTs
MOSFET
GaN
E-mode
p-channel
subthreshold swing
摘要:
In this work, an enhancement-mode (E-mode) p-channel GaN metal-oxide-semiconductor field-effect transistor (p-MOSFET) with a maximum ON-state current (ION) density of 10.5 mA/mm, threshold voltage (V-TH) of - 2.45 V, and I-ON /I-OFF ratio of 10(8) is demonstrated on a commercial GaN wafer designed on a p-GaN HEMT. Furthermore, we present a novel E-mode p-FET featuring an AlN insertion layer within the p-GaN layer. The AlN layer introduces extra capacitance in the conducting channel and decreases the body factor m of devices. The p-GaN/AlN/p-GaN/AlGaN structure reduces the equivalent channel capacitance, achieving a minimum point-by-point subthreshold swing (SS) of 60 mV/dec. Compared with that of the conventional p-GaN channel FET, the SS decreases from 225 to 105 mV/dec over three orders, the V-TH shifts to - 3.05 V, the I-ON /I-OFF ratio increases to 2 x 10(8), and the device also has an ultralow off-state leakage current in the range of 10(-8) mA/mm. The proposed structure is compelling for GaN-based complementary metal-oxide-semiconductor (CMOS) logic and power devices.