关键词:
Transistors
Logic gates
Voltage measurement
Semiconductor device modeling
HEMTs
Gallium nitride
Capacitance
Silicon
MOSFET
Switching circuits
Gallium nitride (GaN) devices
hybrid-drain-embedded gate injection transistor (HD-GIT)
behavioral model
摘要:
Gallium Nitride (GaN) high-electron-mobility transistors (HEMTs), with their superior on-resistance and switching times, provide a promising alternative to Silicon (Si) and SiC devices. Commercially available normally offGaN transistors can be categorized into two main groups: hybrid transistors, which incorporate a Si mosfet, and e-mode transistors. The latter are the most promising GaN transistors, as they do not have the limitations of Si mosfets. Currently, there are two commercial e-mode transistors: the Schottky Gate (SG) p-GaN and the HD-GIT (Hybrid-Drain-embedded Gate Injection Transistor) transistors. However, they differ from the gate terminal standards that have been defined for years by Silicon IGBTs and mosfets (lower threshold voltage, nonconstant Miller plateau, etc.), complicating their adoption in power electronics converters. This is particularly true for the HD-GIT transistor, which diverges from standard mosfet gate operations due to its nonisolated gate terminal. To aid application engineers in understanding these devices and facilitating their adoption in real power applications, simulation models are useful tools. However, there are no simple HD-GIT transistor models that can be easily parameterized by application engineers. Therefore, in this work, an experimentally verified behavioral model of an HD-GIT transistor is presented and described.