关键词:
breakdown electric field
power MOSFET
Schottky barrier (SB)
unintentionally doping (UID)
WBG semiconductor
摘要:
In this article, a Schottky barrier β-Ga 2 O 3 MOSFET is proposed. It shows improvements in drain saturation current, I on / I off ratio, transconductance, and off-state breakdown voltage. The proposed design, which implements the Schottky barrier source and drain contacts, has led to reduced on-state resistance ( R on ), reduced forward voltage drops, faster switching speed, higher frequency, and improved efficiency. After device optimization, we determined that a source and drain having a work function of 3.90 eV result in the highest drain saturation current of ( I ds ) 264 mA. Additionally, in the transfer characteristics, we demonstrate that increasing the channel doping concentration led to a shift toward depletion mode operation, while decreasing the doping concentration moved the device toward enhancement mode at the cost of drain current. Analysis of lattice temperature and self-heating effects on different substrates has also been performed. Furthermore, introducing a passivation layer of SiO 2 as a gate oxide and an unintentionally doped (UID) layer of 400 nm doping concentration of 1.5 × 10 15 cm −3 , results in further significant improvements in the drain saturation current ( I ds ) of 624 mA and transconductance of 38.09 mS, approximately doubling their values compared with the device without a passivation layer of SiO 2 and an I on / I off ratio of 10 15 , and the device's performance at various substrate temperatures has been evaluated. In addition, the inclusion of a passivation layer of SiO 2 improves the breakdown voltage to 2385 V, which is significantly high compared with the conventional device. Moreover, the lower specific-on-resistance R on,sp of 7.6 mΩ/cm 2 and higher breakdown voltage then the high-power figure of merit (PFOM) (BV 2 / R on,sp ) of 748 MW/cm 2 have been achieved.