关键词:
IGBT
Semi-superjunction
Trench gate
R-on.A
摘要:
In this paper, an asymmetric semi-superjunction (SJ) insulated gate bipolar transistor (IGBT) is proposed and investigated. The buffer layer of proposed device is split into two unequal segments with decreasing order of doping in x-direction. One segment is moderately doped, named B-N( (+)), while other is low doped known as B-N((-)). Region B-N((-)) offers maximum flow of carriers, resulting in increase of collector current density with similar breakdown voltage (BV). In off-state, excess electric field exists due to high voltage. This needs to be restricted which is achieved by B-N((+)) region. In semi-SJ device drift resistance is reduced which gives a better performance in the off-state, leading to the lower turn-off loss. Outcomes of TCAD simulation result show a 50.6% reduction in oN-state resistance without degrading the By. Furthermore, 48.8% and 20.3% reduction in turn-off loss and forward voltage drop, respectively, are also observed.